ASML: EUV machine had uptime of 70 percent in one month




ASML has the power of the light source of EUV machines screwed to 130W and machine reaches a customer an uptime of 70 percent in a month. ASML Reported in the publication of its quarterly results.

There are now eight NXE: 3300B-systems on the basis of EUV technology in use by customers, and several of them have now have an uptime of 70 percent in one week is shown. Customers appreciate marathon test with the NXE: 3300B machines. ASML sees progress as a prelude to the use of volume production. ASML reported earlier that a single customer with his NXE 3300B machine uptime of 82 percent was achieved over a week and the end of the year which must be climbed to 86 percent.

At the same time emphasizes evaluating the manufacturer of machines for chip customers how they can use existing immersion lithography machines to the limit. The outcome, versus when the EUV systems are ready for production, determines when EUV machines are used for large-scale production, says ASML CEO Peter Wennink.

ASML is engaged in a race against time to prepare EUV machines for production. Maybe go manufacturers who committed to a part of the 10nm-production of chips, but the pursuit of virtually all chip manufacturers is in any case to allow the 7nm-production via EUV expired. Especially the uptime, the strength of the light source and the number of wafers that can handle the machines need up before.

Sales of ASML came in the quarter to 1.6 billion euros, with a profit of 370 million euros. Revenue increased thereby slightly compared to last year, but profits declined compared to the 399 million euros that ASML earned a year ago.

Machines make use of the EUV light with a wavelength of 13,5nm, which can be applied in a single step, the small structures on wafers, where the current machines on the basis of immersion lithography need for multiple steps. The reduction of the structures is the basis of what is known as Moore’s Law.


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